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IBM Journal of Research and Development

Cell Broadband Engine Technology and Systems   Volume 51, Number 5, 2007
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Polymer self assembly in semiconductor microelectronics - Author Bios

by C. T. Black,
R. Ruiz,
G. Breyta,
J. Y. Cheng,
M. E. Colburn,
K. W. Guarini,
H.-C. Kim,
and Y. Zhang
Biographical sketches of authors

Charles T. Black Brookhaven National Laboratory, Center for Functional Nanomaterials, Upton, New York 11973 (ctblack@bnl.gov). Dr. Black is a Scientist and Scientific Leader for Electronic Nanomaterials in the Center for Functional Nanomaterials at Brookhaven National Laboratory, where he studies applications of nanostructured materials for solid-state energy conversion devices. He received his Ph.D. degree in physics from Harvard University in 1996. From 1996 to 2006 Dr. Black was a Research Staff Member at the IBM Thomas J. Watson Research Center in Yorktown Heights, New York. His research at IBM involved using self assembly to address specific fabrication challenges in high-performance semiconductor electronics.

Ricardo Ruiz Hitachi Global Storage Techologies, 3403 Yerba Buena Road, San Jose, California 95135 (ricardo.ruiz@hitachigst.com). Dr. Ruiz is a Research Staff Member at Hitachi Global Storage Technologies. From 2004 to 2006 he was a Visiting Scientist at the IBM Thomas J. Watson Research Center in Yorktown Heights, New York, and prior to that he was a Postdoctoral Fellow in the Cornell Center for Materials Research. Dr. Ruiz received his Ph.D. degree in physics from Vanderbilt University in 2003. His research includes block copolymer self assembly, thin-film growth of organic and inorganic materials, structural correlations in thin films, and organic electronic devices.

Gregory Breyta IBM Research Division, Almaden Research Center, 650 Harry Road, San Jose, California 95120 (breyta@us.ibm.com). Mr. Breyta joined IBM after receiving his B.S. degree in organic chemistry from the University of California at Berkeley in 1988; he works in the Science and Technology function at the Almaden Research Center. As a member of the Synthetic Development Laboratory, he has worked on the process development, scale up, and commercialization of a diverse range of strategic organic materials utilized by IBM and elsewhere in the microelectronics and storage industries. In addition, he has been involved in research and development of advanced resists, on-chip wiring and hard disk drive materials, adhesion adjuncts, liftoff materials, and photoactive compounds, as well as materials for quantum computing. Mr. Breyta received an IBM Outstanding Innovation Award in 1999 for deep-UV lithography development and implementation, and he is an IBM Master Inventor. He is a member of the American Chemical Society and SPIE (the International Society for Optical Engineering).

Joy Y. Cheng IBM Research Division, Almaden Research Center, 650 Harry Road, San Jose, California 95120 (chengjo@us.ibm.com). Dr. Cheng is a Research Staff Member in the Lithography Materials group at the IBM Almaden Research Center. Her research is focused on polymer self assembly for nanopatterning applications. She received her B.S. and M.S. degrees in chemistry from National Taiwan University, Taiwan, and her Ph.D. degree in materials science and engineering from the Massachusetts Institute of Technology.

Matthew E. Colburn IBM Research Division, Thomas J. Watson Research Center, P.O. Box 218, Yorktown Heights, New York 10598 (mcolburn@us.ibm.com). Dr. Colburn is currently a member of the Advanced Lithography group in the IBM Research Division working on advanced patterning methods and materials. Previously, his research in the Advanced Interconnect Technology group focused on nanofabrication techniques, materials, and integration for high-performance on-chip wiring. Dr. Colburn joined the IBM Research Division in 2001 after receiving his Ph.D. degree in chemical engineering from the University of Texas at Austin, where he worked on nanoimprint lithography.

Kathryn W. Guarini IBM Systems and Technology Group, 2455 South Road, Poughkeepsie, New York 12601 (kwg@us.ibm.com). Dr. Guarini is a Senior Manager in the IBM system processor development organization. Previously, she was on assignment in IBM Corporate Technology, working on technical assessments for the IBM Technology Team. Before that, she was a Research Staff Member and Manager of the 45-nm Front End Integration group in the Silicon Technology Department at the IBM Thomas J. Watson Research Center. Her research included CMOS device fabrication, three-dimensional integrated circuits, and novel nanofabrication techniques and applications. Dr. Guarini joined IBM in 1999 after receiving her Ph.D. degree in applied physics from Stanford University.

Ho-Cheol Kim IBM Research Division, Almaden Research Center, 650 Harry Road, San Jose, California 95120 (hckim@us.ibm.com). Dr. Kim is a Research Staff Member in the Advanced Organic Materials group at the IBM Almaden Research Center. His research areas include block copolymer lithography, block-copolymer–based nanostructures and applications, polymer surfaces and interfaces, and X-ray and neutron scattering. Dr. Kim joined the IBM Research Division in 2001 after postdoctoral research in the Polymer Science and Engineering Department at the University of Massachusetts at Amherst. He received his Ph.D. degree from Seoul National University in Korea.

Ying Zhang IBM Research Division, Thomas J. Watson Research Center, P.O. Box 218, Yorktown Heights, New York 10598 (zhangy@us.ibm.com). Dr. Zhang is currently the manager of the Reactive Ion Etching group in the Silicon Technology Department at the IBM Watson Research Center. He received his Ph.D. degree in physics from the State University of New York at Albany in 1990. From 1990 to 1993, he did his postdoctoral work on plasma–surface interactions and processing at the Watson Research Center. From 1993 to 1996, he was with Tegal Corporation working on developing high-density plasma processing tools and plasma etching processes. Since 1996, he has been a Research Staff Member working at the IBM Thomas J. Watson Research Center on plasma processing for advanced microelectronics applications, including many generations of CMOS device fabrication and nanometer-scale device structures for future technologies.


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