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Volume 41, Numbers 1/2, 1997
Optical lithography |
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Table of contents:  HTML ASCII |
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This article: HTML ASCII |
Copyright info |
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Chemical amplification resists: History and development within IBM - Author bio |
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by H. Ito |
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Biographical sketch of author
Hiroshi Ito
IBM Research Division, Almaden Research Center, 650 Harry Road, San
Jose, California 95120 (HIROSHI at ALMADEN,
hiroshi@almaden.ibm.com). Dr. Ito is a research staff
member in the Science and Technology Department at the Almaden
Research Center. He received his B.S., M.S., and Ph.D. degrees in
chemistry from the University of Tokyo in 1970, 1972, and 1976,
respectively. From 1976 to 1980, he worked as a research associate
at the Chemistry Department of the State University of New York,
Syracuse, on the synthesis of stereoregular polysaccharides for
biological and medical applications. Dr. Ito joined IBM at the San Jose
Research Laboratory in 1980 and has since been working on the
development of new advanced resist materials. In 1986 and 1989,
respectively, he received IBM Outstanding Innovation Awards for his
work on a dry development process involving selective silylation and
for his scientific achievements in developing chemical amplification
resists. In 1988 and 1993 he also received IBM Outstanding Innovation
Awards for inventing a bilayer lift-off process for magnetoresistive
head fabrication. Dr. Ito is a recipient of the Arthur K. Doolittle
Award (1990, American Chemical Society, Division of Polymeric Materials
Science and Engineering), the Award of the Society of Polymer Science,
Japan (1990), and the Cooperative Research Award (1994, American
Chemical Society, Division of Polymeric Materials Science and
Engineering). He is a member of the American Chemical Society, the
Society of Polymer Science, Japan, and the Chemical Society of Japan.
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