Ninth Symposium Updates

INVITED SPEAKERS

The following individuals have accepted an invitation to address technological advances and business perspectives relevant to magnetic materials for storage, MEMS and other applications.

D. Atkinson, Durham University (UK)
“Magnetization Processes in Thin-Film Nanostructures”

F. Faehler, IFM Dresden (Germany)
“Magnetic Shape Memory Alloys and Films: From Fundamentals Towards Applications”

Y. Fukunaka , Kyoto University (Japan)
“Ni Electrodeposition under Magnetic Field”

H. Gatzen, Hanover University (Germany)
“Advances in Magnetic Micro Thin-Film Transducers”

A. Imre, Notre Dame University (USA)
“Fabrication of Magnetic Quantum-dot Cellular Automata”

Y. Kitamoto, Tokyo Institute of Technology (Japan)
“Direct Synthesis of Ferromagnetic Fe-Pt Nanoparticles by Using a High-pressure Chemical Solution Route with Microwave Irradiation”

K. Leistner, IFW Dresden (Germany)
“Electrodeposited Fe-Pt Films and Multilayers”

D. Litvinov, University of Houston (USA)
“Design and Fabrication of High Anisotropy Nanoscale Patterned Magnetic Recording Medium for Data Storage Applications”

N. Myung,  University of California - Riverside (USA)
“Magnetotransport Phenomena of Single Ferromagnetic Nanowire”

T. Nakamura, Canon Corp. (Japan)
“Electrodeposition of FePt Embedded into Nanohole Structures for Magnetic Recording Media”

Y. Nakamura, Tohoku University (Japan)
“Long Journey in Perpendicular Magnetic Recording – From the Beginning to the Future”

E. O'Sullivan, IBM T.J. Watson Research Center (USA)
“A Novel Selective Freelayer Wet Etching Method for Magnetic Tunnel Junction-Based MRAM”

E. Quandt, Center of Advanced European Studies and Research (Germany) “Magnetoelectronical Sensors for Mechanical Measurements”

R. Schad, University of Alabama (USA)
“Electrodeposition as a Versatile Analytical and Preparation Tool”

J. Switzer, University of Missouri-Rolla (USA)
“Epitaxial Electrodeposition of Fe3O4 Films on Low Index Gold Single Crystals by the Reduction of Fe(III)-triethanolamine”

I. Tabakovic, Seagate Technology (USA)
“Electrodeposition of Rhodium from CoFe Plating Solution and Characterization of Thin Films”

K. Tsunekawa, Canon-ANELVA (Japan)
“Structural Study of CoFeB/MgO/CoFeB Magnetic Tunnel Junctions”

G. Zangari, University of Virginia (USA)
“Anisotropy and Coercivity of Electrodeposited Co-Pt films on Oriented Ruthenium”

COMPLETE SYMPOSIUM PROGRAM